ALD 2012 header
General Information
Housing & Travel
Call for Abstracts
Technical Program
Platinum Sponsors
Oxford Instruments
Air Products
Cambridge Nanotech
Applied Materials

Please contact ald(at) for Sponsor/Exhibit Forms.

The organizers wish to thank all attendees for the sucessful conference!

Photograph of the conference dinner and ALOHA-Party boat (courtesy of Martin Knaut).

Electronic Proceedings:

The electronic proceedings of the conference will be mailed by end of August 2012 to the
addresses of the attendees.

Separate orders for the electronic proceedings of the ALD-conferences 2011 and 2012
can be placed online: 

For electronic proceedings of earlier conferences, please contact

Publication submission:

Journal of Vacuum Science & Technology is soliciting research articles for publication in a Special January/February 2013 Issue on Atomic Layer Deposition.

This special issue is planned in collaboration with the 12th International Conference on Atomic Layer Deposition (ALD 2012) to be held at Dresden Germany during June 17-20, 2012. The Special Issue will be dedicated to the science and technology of atomic layer controlled deposition of thin films. While a significant fraction of the articles are expected to be based on material presented at ALD 2012, research articles that are on ALD but were not presented at this conference are also welcome: the special issue will be open to all articles on the science and technology of ALD.

Please download the announcement for further details (download).

Manuscript deadline: August 1, 2012


At the AVS-ALD 2012 / Baltic ALD 2012 following awards will be issued:

Best Poster Award     sponsored by   Oxford Instruments
Best Student Paper Award sponsored by   LAM Research

Local Organization

If you have any question don't hestitate to contact the local organiztion team:
Uwe Schröder, Mato Knez, or Marcel Kovacs
NaMLab gGmbH Noethnitzer Strasse 64, 01187 Dresden (Germany)
Fax +49.351.475.83.900
e-mail: ald(at)
Please replace "(at)" with "@"



The AVS Topical Conference on Atomic Layer Deposition (ALD 2012) will be a three-day meeting (preceded by one day of tutorials), dedicated to the science and technology of atomic layer controlled deposition of thin films. Atomic layer deposition (ALD) is used to fabricate ultrathin and conformal thin film structures for many semiconductor and thin film device applicati ons. A unique attribute of ALD is that it uses sequential self-limiting surface reactions to achieve control of film growth in the monolayer or sub-monolayer thickness regime. ALD is receiving attention for its potential applications from advanced electronics, microsystems, and displays to energy capture and storage, solid state lighting, biotechnology, security, and consumer products - particularly for any advanced technologies that require control of film structure in the nanometer or sub-nanometer scale.

ALD's unique capabilities promote tremendous diversity in potential applications with value for specialized, custom applications as well as mass manufacturing. Abstract submissions are encouraged in areas such as ALD manufacturability, equipment design, modeling and simulation, sensing and advanced process control, high throughput strategies, and emerging ALD applications to supplement a group of invited talks in these sessions.

As in past conferences, the presentations will follow an all-electronic format, and electronic copies of the presentations (including oral component, and questions and answers) will be made available in the form of copy-secured DVDs.

The conference covered a wide range of topics including
Precursors & Chemistry
  • Precursors, Precursor Design & Recipe Development
  • Simulation, Modeling, & Theory of ALD
  • Precursor Delivery Systems
Growth & Characterization
  • In-situ Monitoring & Analysis
  • ALD Surface Chemistry & Initiation of ALD Growth
  • Surface Preparation for ALD
  • Characterization of ALD Coatings
  • Highly Conformal ALD Processes
Novel Materials
  • Molecular Layer Deposition
  • Organic-Inorganic Hybrid Materials
  • Atomic Layer Epitaxy & Doping
  • Magnetic Materials
Nanostructure Synthesis and Fabrication
  • Nanotubes, nanowires, nanopores
  • Nanoparticles
  • Patterned & Selective Area ALD
  • Nano-laminates from Multi-component Materials
  • ALD Integration with Conventional Processes
 ALD Applications in Energy
  • Catalysis and fuel cells
  • Solar – photovoltaic and photocatalytic
  • Batteries and storage
 ALD Applications in Electronics
  • High-k and related device applications
  • Interconnect technologies
 ALD applications in MEMS/NEMS
  • Active layers
  • Mechanical and tribological coatings
  • ALD integration
 ALD Applications in Biotechnology
  • Anti-bacterial Films
  • Biocompatible Materials
  • Medical Devices
 ALD Applications in Lighting & Display
  • Optical
 Industrialization of ALD
  • Key issues in ALD manufacturability
  • Equipment designs and considerations
  • Sensing and advanced process control
  • Reactor and throughput modeling
  • Large format, roll to roll, and fast ALD
  • ALD process integration
  • Major application opportunities
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